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Permanent URL to this publication: http://dx.doi.org/10.5167/uzh-10389

Bartolf, H; Engel, A; Schilling, A; Il in, K; Siegel, M (2008). Fabrication of metallic structures with lateral dimensions less than 15 nm and jc(T)-measurements in NbN micro- and nanobridges. Physica C: Superconductivity, 468(7-10):793-796.

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Abstract

We report about a process that enables us to manufacture nm-sized structures that are characterized in a four-point resistivity measurement. To define the nanostructures, we employ either a lift-off deposition process or a dry etching process. With the lift-off deposition, we were able to define line widths below 15 nm spatial dimension. The same technique allowed the fabrication of a current-carrying bridge with ≈30 nm × 10 nm cross section. The etch-process step allowed us to generate a superconducting meander structure covering an area of ≈13.5 μm × 10.5 μm. We also present critical-current measurements vs. temperature on sub-μm and μm sized bridges prepared by a different technique. These data support the idea of a geometrical edge barrier for vortex entry into sub-μm wide bridges.

Item Type:Journal Article, refereed, original work
Communities & Collections:07 Faculty of Science > Physics Institute
DDC:530 Physics
Language:English
Date:01 April 2008
Deposited On:10 Feb 2009 13:22
Last Modified:27 Nov 2013 18:33
Publisher:Elsevier
ISSN:0921-4534
Publisher DOI:10.1016/j.physc.2007.11.049
Citations:Web of Science®. Times Cited: 3
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