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Permanent URL to this publication: http://dx.doi.org/10.5167/uzh-10395

Ilin, K; Schneider, R; Gerthsen, D; Engel, A; Bartolf, H; Schilling, A; Semenov, A; Huebers, H W; Freitag, B; Siegel, M (2008). Ultra-thin NbN films on Si: crystalline and superconducting properties. Journal of Physics: Conference Series, 97:012045.

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Abstract

We present results on superconducting and crystalline properties of NbN films with a thickness smaller than 10 nm. The films were deposited using reactive magnetron sputtering on heated silicon substrates. Zero resistance critical temperatures of about 9 K have been measured for films with a thickness of about 5 nm and reaches values approx12 K for 10 nm thick films. A value of the superconducting coherence length of about 4 nm was estimated from the measurements of the second critical magnetic field. High-resolution transmission electron microscopy accompanied with electron-spectroscopy techniques was used to analyze the structure, thickness, and film-substrate interface of fabricated films. The interrelations between fabrication conditions, superconducting and crystalline properties of NbN films on Si substrates are presented and discussed.

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Additional indexing

Item Type:Journal Article, not refereed, original work
Communities & Collections:07 Faculty of Science > Physics Institute
DDC:530 Physics
Language:English
Date:2008
Deposited On:09 Feb 2009 16:40
Last Modified:28 Nov 2013 01:44
Publisher:Institute of Physics Publishing
ISSN:1742-6588
Publisher DOI:10.1088/1742-6596/97/1/012045

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