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Silicon protected with atomic layer deposited TiO2: conducting versus tunnelling through TiO2


Seger, Brian; Tilley, S David; Pedersen, Thomas; Vesborg, Peter C K; Hansen, Ole; Grätzel, Michael; Chorkendorff, Ib (2013). Silicon protected with atomic layer deposited TiO2: conducting versus tunnelling through TiO2. Journal of Materials Chemistry A, 1(47):15089-15094.

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Additional indexing

Item Type:Journal Article, refereed, original work
Communities & Collections:07 Faculty of Science > Department of Chemistry
Dewey Decimal Classification:540 Chemistry
Language:English
Date:2013
Deposited On:28 May 2015 07:00
Last Modified:28 May 2016 07:21
Publisher:Royal Society of Chemistry
ISSN:2050-7488
Publisher DOI:https://doi.org/10.1039/c3ta12309j

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