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Advanced X-ray diffractive optics


Vila-Comamala, J; Jefimovs, K; Pilvi, T; Ritala, M; Sarkar, S S; Solak, H H; Guzenko, V A; Stampanoni, M; Marone, F; Raabe, J; Tzvetkov, G; Fink, R H; Grolimund, D; Borca, C N; Kaulich, B; David, C (2009). Advanced X-ray diffractive optics. Journal of Physics: Conference Series, 186:012078.

Abstract

X-ray microscopy greatly bene�ts from the advances in x-ray optics. At the
Paul Scherrer Institut, developments in x-ray di�ractive optics include the manufacture and
optimization of Fresnel zone plates (FZPs) and di�ractive optical elements for both soft and
hard x-ray regimes. In particular, we demonstrate here a novel method for the production of
ultra-high resolution FZPs. This technique is based on the deposition of a zone plate material
(iridium) onto the sidewalls of a prepatterned template structure (silicon) by atomic layer
deposition. This approach overcomes the limitations due to electron-beam writing of dense
patterns in FZP fabrication and provides a clear route to push the resolution into sub-10 nm
regime. A FZP fabricated by this method was used to resolve test structures with 12 nm lines
and spaces at the scanning transmission x-ray microscope of the PolLux beamline of the Swiss
Light Source at 1.2 keV photon energy.

X-ray microscopy greatly bene�ts from the advances in x-ray optics. At the
Paul Scherrer Institut, developments in x-ray di�ractive optics include the manufacture and
optimization of Fresnel zone plates (FZPs) and di�ractive optical elements for both soft and
hard x-ray regimes. In particular, we demonstrate here a novel method for the production of
ultra-high resolution FZPs. This technique is based on the deposition of a zone plate material
(iridium) onto the sidewalls of a prepatterned template structure (silicon) by atomic layer
deposition. This approach overcomes the limitations due to electron-beam writing of dense
patterns in FZP fabrication and provides a clear route to push the resolution into sub-10 nm
regime. A FZP fabricated by this method was used to resolve test structures with 12 nm lines
and spaces at the scanning transmission x-ray microscope of the PolLux beamline of the Swiss
Light Source at 1.2 keV photon energy.

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2 citations in Web of Science®
4 citations in Scopus®
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Additional indexing

Item Type:Journal Article, refereed, original work
Communities & Collections:04 Faculty of Medicine > Institute of Biomedical Engineering
Dewey Decimal Classification:170 Ethics
610 Medicine & health
Date:2009
Deposited On:17 Feb 2010 09:15
Last Modified:05 Apr 2016 13:43
Publisher:Institute of Physics Publishing
ISSN:1742-6588
Publisher DOI:10.1088/1742-6596/186/1/012078
Permanent URL: http://doi.org/10.5167/uzh-27028

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