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Permanent URL to this publication: http://dx.doi.org/10.5167/uzh-3449

He, Y B; Seitsonen, A P; Over, H (2006). Ultrathin Rh films on Ru(0001): oxidation in confinement. Journal of Chemical Physics, 124(3):034706.

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Abstract

Ultrathin rhodium films with a thickness ranging from 1 to a few monolayers were deposited on a single-crystal Ru(0001) surface in order to investigate the oxidation behavior of ultrathin epitaxial films on a dissimilar substrate. It is found that rhodium grows on Ru(0001) initially layer by layer, adapting the in-plane lattice parameters of Ru(0001). When exposing Rh films to oxygen environment (similar to 4.8x10(6) L O-2 exposure) at 660 K, 2-4 ML Rh films form a surface oxide composed of (9x9) O-Rh-O trilayers. Quite in contrast, oxidation of the 1 ML Rh/Ru(0001) film leads to a poorly ordered oxide with a rutile structure reminiscent of RuO2(110) on Ru(0001). The oxidized 1 ML Rh/Ru(0001) film contains much more oxygen than the oxidized thicker Rh films. Lower temperatures (535 K) and high doses of oxygen lead to a (1x1)-O overlayer on the 1 ML Rh/Ru(0001) surface, whose atomic geometry resembles closely that of the (1x1)-O phase on clean Ru(0001).

Item Type:Journal Article, refereed, original work
Communities & Collections:07 Faculty of Science > Department of Chemistry
DDC:540 Chemistry
Language:English
Date:January 2006
Deposited On:23 Mar 2009 18:13
Last Modified:05 Jun 2014 13:51
Publisher:American Institute of Physics
ISSN:0021-9606
Publisher DOI:10.1063/1.2159489
PubMed ID:16438599
Citations:Google Scholarā„¢

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