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Patent- und Musterrecht: PatR


Patent- und Musterrecht: PatR. Edited by: Heinemann, Andreas (2010). München, Germany: C H Beck.

Additional indexing

Item Type:Edited Scientific Work
Communities & Collections:02 Faculty of Law > Institute of Legal Sciences > Business Law
Dewey Decimal Classification:340 Law
Language:German
Date:2010
Deposited On:27 Dec 2010 09:52
Last Modified:05 Apr 2016 14:31
Publisher:C H Beck
Series Name:Beck-Texte im dtv
Volume:5563
Number of Pages:694
ISBN:978-3-406-56963-0
Additional Information:10. Auflage, Stand: 1. Oktober 2009
Related URLs:http://rsw.beck.de/rsw/default.asp (Publisher)
http://opac.nebis.ch/F/?local_base=NEBIS&con_lng=GER&func=find-b&find_code=SYS&request=005728414

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