Permanent URL to this publication: http://dx.doi.org/10.5167/uzh-43736
Gorelick, S; Vila-Comamala, J; Guzenko, V; Mokso, R; Stampanoni, M; David, C (2010). Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication. Microelectronic Engineering, 87(5-8):1052-1056.
- Registered users only
View at publisher
We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in not, vert, similar1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.
0 downloads since deposited on 30 Jan 2011
0 downloads since 12 months
|Item Type:||Journal Article, refereed, original work|
|Communities & Collections:||04 Faculty of Medicine > Institute of Biomedical Engineering|
|Dewey Decimal Classification:||170 Ethics
610 Medicine & health
|Deposited On:||30 Jan 2011 20:12|
|Last Modified:||05 Apr 2016 14:40|
|Additional Information:||The 35th International Conference on Micro- and Nano-Engineering (MNE)|
Users (please log in): suggest update or correction for this item
Repository Staff Only: item control page