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Permanent URL to this publication: http://dx.doi.org/10.5167/uzh-43736

Gorelick, S; Vila-Comamala, J; Guzenko, V; Mokso, R; Stampanoni, M; David, C (2010). Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication. Microelectronic Engineering, 87(5-8):1052-1056.

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Abstract

We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in not, vert, similar1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.

Item Type:Journal Article, refereed, original work
Communities & Collections:04 Faculty of Medicine > Institute of Biomedical Engineering
DDC:170 Ethics
610 Medicine & health
Language:English
Date:2010
Deposited On:30 Jan 2011 20:12
Last Modified:27 Nov 2013 20:37
Publisher:Elsevier
ISSN:0167-9317
Additional Information:The 35th International Conference on Micro- and Nano-Engineering (MNE)
Publisher DOI:10.1016/j.mee.2009.11.091
Citations:Web of Science®. Times Cited: 16
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Scopus®. Citation Count: 16

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