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Patent- und Musterrecht (9. Aufl.)


Patent- und Musterrecht (9. Aufl.). Edited by: Beier, Friedrich Karl; Heinemann, Andreas (2008). München, Germany: C H Beck.

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Item Type:Edited Scientific Work
Communities & Collections:02 Faculty of Law > Institute of Legal Sciences > Business Law
Dewey Decimal Classification:340 Law
Language:German
Date:2008
Deposited On:20 Jan 2009 13:13
Last Modified:05 Apr 2016 12:51
Publisher:C H Beck
Series Name:Beck-Texte im dtv
Volume:5563
Number of Pages:668
ISBN:978-3-406-56963-0
Related URLs:http://rsw.beck.de/rsw/default.asp (Publisher)
http://opac.nebis.ch/F/?local_base=NEBIS&con_lng=GER&func=find-b&find_code=SYS&request=005728414

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