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Silicon protected with atomic layer deposited TiO2: durability studies of photocathodic H2 evolution


Seger, Brian; Tilley, S David; Pedersen, Thomas; Vesborg, Peter C K; Hansen, Ole; Grätzel, Michael; Chorkendorff, Ib (2013). Silicon protected with atomic layer deposited TiO2: durability studies of photocathodic H2 evolution. RSC Advances, 3(48):25902-25907.

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Item Type:Journal Article, refereed, original work
Communities & Collections:07 Faculty of Science > Department of Chemistry
Dewey Decimal Classification:540 Chemistry
Language:English
Date:2013
Deposited On:28 May 2015 07:00
Last Modified:05 Apr 2016 19:15
Publisher:RSC Publishing
ISSN:2046-2069
Publisher DOI:https://doi.org/10.1039/c3ra45966g

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