Header

UZH-Logo

Maintenance Infos

Fabrication of metallic double-gate field emitter arrays and their electron beam collimation characteristics


Helfenstein, P; Jefimovs, K; Kirk, E; Escher, C; Fink, H-W; Tsujino, S (2012). Fabrication of metallic double-gate field emitter arrays and their electron beam collimation characteristics. Journal of Applied Physics, 112(9):093307.

Abstract

The fabrication of double-gate metallic field emitter arrays with large collimation gate apertures and their field emission beam characteristics are reported. The device fabrication steps, including the molding technique for array fabrication, the electron extraction gate fabrication by the self-aligned resist etch-back method, and the fabrication of the collimation gate electrode using a focused ion beam assisted method are described in detail. The experimental results of 2 × 2 tip arrays with the proposed double-gate structure demonstrate an order of magnitude enhancement in beam brightness with minimal current loss. A similarly high beam brightness enhancement was achieved with a 20 × 20 tip array device, showing the scalability of the proposed structure. The observation of improved current-voltage characteristics with the 20 × 20 tip array is ascribed to the difference in gate aperture shape. The possibility of further improving the beam characteristics of double-gate field emitter arrays and the reduction of the transverse electron velocity spread are discussed.

Abstract

The fabrication of double-gate metallic field emitter arrays with large collimation gate apertures and their field emission beam characteristics are reported. The device fabrication steps, including the molding technique for array fabrication, the electron extraction gate fabrication by the self-aligned resist etch-back method, and the fabrication of the collimation gate electrode using a focused ion beam assisted method are described in detail. The experimental results of 2 × 2 tip arrays with the proposed double-gate structure demonstrate an order of magnitude enhancement in beam brightness with minimal current loss. A similarly high beam brightness enhancement was achieved with a 20 × 20 tip array device, showing the scalability of the proposed structure. The observation of improved current-voltage characteristics with the 20 × 20 tip array is ascribed to the difference in gate aperture shape. The possibility of further improving the beam characteristics of double-gate field emitter arrays and the reduction of the transverse electron velocity spread are discussed.

Statistics

Citations

10 citations in Web of Science®
7 citations in Scopus®
Google Scholar™

Altmetrics

Downloads

83 downloads since deposited on 31 Jan 2013
12 downloads since 12 months
Detailed statistics

Additional indexing

Item Type:Journal Article, refereed, original work
Communities & Collections:07 Faculty of Science > Physics Institute
Dewey Decimal Classification:530 Physics
Language:English
Date:2012
Deposited On:31 Jan 2013 15:20
Last Modified:07 Dec 2017 19:05
Publisher:American Institute of Physics
ISSN:0021-8979
Free access at:Publisher DOI. An embargo period may apply.
Publisher DOI:https://doi.org/10.1063/1.4764925

Download

Download PDF  'Fabrication of metallic double-gate field emitter arrays and their electron beam collimation characteristics'.
Preview
Content: Published Version
Filetype: PDF
Size: 2MB
View at publisher