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Note: An ion source for alkali metal implantation beneath graphene and hexagonal boron nitride monolayers on transition metals


de Lima, L H; Cun, H Y; Hemmi, A; Kälin, T; Greber, T (2013). Note: An ion source for alkali metal implantation beneath graphene and hexagonal boron nitride monolayers on transition metals. Review of Scientific Instruments, 84(12):126104.

Abstract

The construction of an alkali-metal ion source is presented. It allows the acceleration of rubidium ions to an energy that enables the penetration through monolayers of graphene and hexagonal boron nitride. Rb atoms are sublimated from an alkali-metal dispenser. The ionization is obtained by surface ionization and desorption from a hot high work function surface. The ion current is easily controlled by the temperature of ionizer. Scanning Tunneling Microscopy measurements confirm ion implantation.

Abstract

The construction of an alkali-metal ion source is presented. It allows the acceleration of rubidium ions to an energy that enables the penetration through monolayers of graphene and hexagonal boron nitride. Rb atoms are sublimated from an alkali-metal dispenser. The ionization is obtained by surface ionization and desorption from a hot high work function surface. The ion current is easily controlled by the temperature of ionizer. Scanning Tunneling Microscopy measurements confirm ion implantation.

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Additional indexing

Item Type:Journal Article, refereed, original work
Communities & Collections:07 Faculty of Science > Physics Institute
Dewey Decimal Classification:530 Physics
Language:English
Date:2013
Deposited On:20 Feb 2014 11:44
Last Modified:23 May 2016 07:12
Publisher:American Institute of Physics
ISSN:0034-6748
Free access at:Publisher DOI. An embargo period may apply.
Publisher DOI:https://doi.org/10.1063/1.4848936

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