Publication: Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication
Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication
Date
Date
Date
Citations
Gorelick, S., Vila-Comamala, J., Guzenko, V., Mokso, R., Stampanoni, M., & David, C. (2010). Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication. Microelectronic Engineering, 87(5–8), 1052–1056. https://doi.org/10.1016/j.mee.2009.11.091
Abstract
Abstract
Abstract
We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in not, vert, similar1 μm thick layers of PMMA. This method was successfully applie
Additional indexing
Creators (Authors)
- Gorelick, S
- Vila-Comamala, J
- Guzenko, V
- Mokso, R
- Stampanoni, M
- David, C
Volume
Volume
Volume
Number
Number
Number
Page range/Item number
Page range/Item number
Page range/Item number
Page end
Page end
Page end
Item Type
Item Type
Item Type
In collections
Dewey Decimal Classifikation
Dewey Decimal Classifikation
Dewey Decimal Classifikation
Language
Language
Language
Publication date
Publication date
Publication date
Date available
Date available
Date available
ISSN or e-ISSN
ISSN or e-ISSN
ISSN or e-ISSN
Additional Information
Additional Information
Additional Information
OA Status
OA Status
OA Status
Publisher DOI
Citations
Gorelick, S., Vila-Comamala, J., Guzenko, V., Mokso, R., Stampanoni, M., & David, C. (2010). Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication. Microelectronic Engineering, 87(5–8), 1052–1056. https://doi.org/10.1016/j.mee.2009.11.091
