Publication: High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication
High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication
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Romano, L., Vila-Comamala, J., Kagias, M., Vogelsang, K., Schift, H., Stampanoni, M., & Jefimovs, K. (2017). High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication. Microelectronic Engineering, 176, 6–10. https://doi.org/10.1016/j.mee.2016.12.032
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Metal microstructured optical elements for grating-based X-ray phase-contrast interferometry were fabricated by using an innovative approach of microcasting: hot embossing technology with low melting temperature (280 °C) metal alloy foils and silicon etched templates. A gold-tin alloy (80 wt% Au/20 wt% Sn) was used to cast micro-gratings with pitch sizes in the range of 2 to20 μm and depth of the structures up to 80 μm. The metal filling of the silicon template strongly depends on the wetting properties of the liquid metal on the groo
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- Romano, Lucia
- Vila-Comamala, Joan
- Kagias, Matias
- Vogelsang, Konrad
- Schift, Helmut
- Stampanoni, Marco
- Jefimovs, Konstantins
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Romano, L., Vila-Comamala, J., Kagias, M., Vogelsang, K., Schift, H., Stampanoni, M., & Jefimovs, K. (2017). High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication. Microelectronic Engineering, 176, 6–10. https://doi.org/10.1016/j.mee.2016.12.032