Patent- und Musterrecht (9. Aufl.). Edited by: Beier, Friedrich Karl; Heinemann, Andreas (2008). München, Germany: C H Beck.
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| Item Type: | Edited Scientific Work |
|---|---|
| Communities & Collections: | 02 Faculty of Law > Institute of Legal Sciences > Business Law |
| Dewey Decimal Classification: | 340 Law |
| Language: | German |
| Date: | 2008 |
| Deposited On: | 20 Jan 2009 13:13 |
| Last Modified: | 15 Apr 2021 13:57 |
| Publisher: | C H Beck |
| Series Name: | Beck-Texte im dtv |
| Volume: | 5563 |
| Number of Pages: | 668 |
| ISBN: | 978-3-406-56963-0 |
| OA Status: | Closed |
| Related URLs: | http://rsw.beck.de/rsw/default.asp (Publisher) |
Beier, Friedrich Karl