Silicon protected with atomic layer deposited TiO2: conducting versus tunnelling through TiO2
Seger, Brian; Tilley, S David; Pedersen, Thomas; Vesborg, Peter C K; Hansen, Ole; Grätzel, Michael; Chorkendorff, Ib (2013). Silicon protected with atomic layer deposited TiO2: conducting versus tunnelling through TiO2. Journal of Materials Chemistry A, 1(47):15089-15094.
Additional indexing
| Item Type: | Journal Article, refereed, original work |
|---|---|
| Communities & Collections: | 07 Faculty of Science > Department of Chemistry |
| Dewey Decimal Classification: | 540 Chemistry |
| Scopus Subject Areas: | Physical Sciences > General Chemistry
Physical Sciences > Renewable Energy, Sustainability and the Environment Physical Sciences > General Materials Science |
| Language: | English |
| Date: | 2013 |
| Deposited On: | 28 May 2015 07:00 |
| Last Modified: | 13 Mar 2025 02:36 |
| Publisher: | Royal Society of Chemistry |
| ISSN: | 2050-7488 |
| OA Status: | Closed |
| Publisher DOI: | https://doi.org/10.1039/c3ta12309j |
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Seger, Brian