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Monolayer calibration of endofullerenes with x-ray absorption from implanted keV ion doses

Lee, Wei Chuang; Yu, Lebin; Oscarsson, Johan; Ochapski, Michal W; Sagehashi, Ryunosuke; Zhang, Yang; Popov, Alexey A; Gebeyehu, Zewdu M; Martini, Leonardo; Forti, Stiven; Coletti, Camilla; Delley, Bernard; Muntwiler, Matthias; Primetzhofer, Daniel; Greber, Thomas (2024). Monolayer calibration of endofullerenes with x-ray absorption from implanted keV ion doses. Journal of Vacuum Science & Technology A, 42(2):023406.

Abstract

X-ray absorption spectroscopy (XAS) has the highest sensitivity for chemical element detection on surfaces. With this approach, small amounts of lanthanide-containing endofullerene molecules (Ho3N@C80) have been measured by total electron yield at a low flux bending magnet beamline. The monolayer coverage is calibrated by extrapolating the signals of constant doses (3×1014 cm−2) of Ho ions implanted into SiO2 with energies between 2 and 115 keV. At room temperature, the Ho XAS spectra of the molecules and implanted ions indicate trivalent but not identical Ho ground states. Still, this approach demonstrates a way for calibration of small coverages of molecules containing open core-shell elements.

Additional indexing

Item Type:Journal Article, refereed, original work
Communities & Collections:07 Faculty of Science > Physics Institute
Dewey Decimal Classification:530 Physics
Scopus Subject Areas:Physical Sciences > Condensed Matter Physics
Physical Sciences > Surfaces and Interfaces
Physical Sciences > Surfaces, Coatings and Films
Language:English
Date:1 March 2024
Deposited On:04 Sep 2024 10:57
Last Modified:31 Dec 2024 04:40
Publisher:American Institute of Physics
ISSN:0734-2101
OA Status:Hybrid
Publisher DOI:https://doi.org/10.1116/6.0003302
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